Semiconductor device fabrication utilizes a variety of chemicals, whose metallic impurity levels must remain at ultra-trace levels to ensure end product quality. Inductively coupled plasma mass spectrometry (ICP-MS) is one of the most sensitive techniques for metallic impurities testing and has become an indispensable analytical tool in the semiconductor industry. Most chemicals are analyzed with minimal to no dilution using method of standard addition (MSA) for improved data precision and accuracy.
This work describes the analysis of metallic impurities in semiconductor-grade chemicals using an Automated Standard Addition System (ASAS) coupled to a NexION® 5000 Multi-Quadrupole ICP-MS.